Monday, November 03, 2025

Substrate

Substrate XRL Mechanism (Animated) Watch: Electrons → X-rays → Pattern Transfer (with motion control challenge) 💰 CHEAP LAND (Outside Cleanroom) Particle Accelerator (Synchrotron / Linear) X Target ⚡ Electron Acceleration • Energy: ~GeV scale • Beam current: mA range • Pulse rate: MHz • X-ray flux: High ✓ Large size OK - no cleanroom needed here Cost savings: Build on cheap industrial land ~$40M per tool (estimated) X-rays (~1nm) Vacuum beam transport 🏭 EXPENSIVE CLEANROOM XRL Exposure System X-ray Mask ↕ Proximity gap (~10-50μm) Silicon Wafer + Photoresist ⚙️ Precision Wafer Stage 6-DOF motion control required ±0.1nm needed! ⚠️ THE CHALLENGE Atomic-level precision motion control: • <0.1nm positioning • Real-time correction • Overlay accuracy Process Flow: How XRL Works 1️⃣ Accelerate Electrons accelerated to GeV energies in particle accelerator ✓ Solved (National lab tech) 2️⃣ Generate e⁻ hits target → X-rays produced via Bremsstrahlung ✓ Solved (Physics understood) 3️⃣ Transport X-rays travel through vacuum tube to lithography chamber ✓ Solved (Standard engineering) 4️⃣ Pattern X-rays pass through mask, expose wafer (proximity printing) ⚠️ Partial (Alignment needed) 5️⃣ Control Nanometer motion control & alignment across full wafer ❌ UNSOLVED (The moat!) Animation shows: electrons → X-rays → patterned exposure → moving wafer stage (emphasizing control challenge)
張貼者： 於

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